4Wave Cluster Deposition System_edit
IMG_5357_edit
1520 PSIBE_edit
4Wave Laboratory Nanolayer Sputtering System_edit
1400Q312 LL Etch_edit

4Wave Z-Flex System

The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering. This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition.

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4Wave Ion Beam Sputtering Cluster Tool

The 4Wave ion beam sputtering cluster tool has maintained 4Wave’s 95% market share in the Vanadium Oxide Processing community (MEMS Market).

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4Wave Laboratory Alloy and Nanolayer System (LANS)

世界杯在哪买球The LANS is 4Wave’s Flagship R&D system. This system has received wide acceptance in the academic materials research world. Equipped with multiple processing targets, it is a very versatile platform for multilayer material synthesis and compositional nanotechnology.

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4Wave Planetary Etch System (PSIBE)

世界杯在哪买球The 4Wave Planetary system expands the 4Wave LL Etch system to include 3 processing stages for high throughput.

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4Wave Load Lock Etch System

世界杯在哪买球The 4Wave LL Etch System is a Flagship product addressing several significant markets. This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.

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